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87 WASTEWATER MANAGEMENT IN SEMICONDUCTING ELECTRONIC CRYSTAL MANUFACTURING FACILITIES Joseph M. Wong, Project Manager Brown and Caldwell Consulting Engineers Pleasant Hill, California 94523 INTRODUCTION The last 15 to 20 years have seen a rapid evolution of electronic technology. The semiconducting electronic crystals industry is growing in the United States as well as in other parts of the world. A major part of that evolution has been the development of single crystals with unique structural and electronic properties. These crystals are essential parts of most microelectronic devices. The manufacturing processes require large quantities of chemicals and water for etching and cleaning. Consequently, wastewater from these plants may require extensive treatment before discharge. Figure 1 shows the basic manufacturing processes for semiconducting electronic crystals and some of the wastes produced.1 ENVIRONMENTAL REGULATIONS The U.S. Environmental Protection Agency (EPA) promulgated regulations to limit the discharge of pollutants into navigable waters and publicly owned treatment works (POTW) from semiconductor and electronic crystal manufacturing facilities on April 8, 1983.2 Under the title "Electrical and Electronic Components Point Source Category Effluent Limitations Guidelines, Pretreatment Standards, and New Source Performance Standards," these regulations provided effluent limitations for "best practicable technology" (BPT), "best available technology" (BAT), "best conventional technology" (BCT), "new source performance standards" (NSPS) for direct dischargers, and pretreatment standards for new and existing sources (PSNS and PSES) of indirect dischargers. Table I presents the effluent limitations for the Electronic Crystals Subcategory of these regulations. Materials listed as comprising total toxic organics (TTO) in these regulations include 30 priority organic compounds2 that were detected in significant quantities during the sampling and analytical EPA program conducted as a basis for the regulation. Since periodic effluent sampling and analysis for these numerous organics could be very expensive, this regulation allows, as an alternative to the usual monitoring requirements, plants to certify that spent solvents are not discharged into the wastewater, but are collected for contract disposal or for sale to reclaimers. In requesting that no monitoring of TTO be required, plants must submit a solvent management plan to the permitting authority. This plan then becomes a provision of the permit. WASTEWATER CHARACTERISTICS EPA has developed the limitations and standards in these regulations to cover a typical plant for this industry. However, in specific cases, such as more stringent state water quality standards, the permitting authority may have to establish permit limits on toxic or conventional pollutants that are not covered by this regulation. Furthermore, discharges to POTW are required to comply with local ordinances that may be more stringent than these pretreatment limitations. Based on the author's experience with integrated silicon wafer manufacturing plants, other significant water borne pollutants that may occur in these wastewaters include biochemical and chemical oxygen demand (BOD/ COD), nitrate, ammonia, and chromium. Chromium is regulated under the Metal Finishing Category Regulations. 863
Object Description
Purdue Identification Number | ETRIWC198787 |
Title | Wastewater management in semiconducting electronic crystal manufacturing facilities |
Author | Wong, Joseph M. |
Date of Original | 1987 |
Conference Title | Proceedings of the 42nd Industrial Waste Conference |
Conference Front Matter (copy and paste) | http://e-archives.lib.purdue.edu/u?/engext,38818 |
Extent of Original | p. 863-872 |
Collection Title | Engineering Technical Reports Collection, Purdue University |
Repository | Purdue University Libraries |
Rights Statement | Digital object copyright Purdue University. All rights reserved. |
Language | eng |
Type (DCMI) | text |
Format | JP2 |
Date Digitized | 2009-08-03 |
Capture Device | Fujitsu fi-5650C |
Capture Details | ScandAll 21 |
Resolution | 300 ppi |
Color Depth | 8 bit |
Description
Title | page 863 |
Collection Title | Engineering Technical Reports Collection, Purdue University |
Repository | Purdue University Libraries |
Rights Statement | Digital copyright Purdue University. All rights reserved. |
Language | eng |
Type (DCMI) | text |
Format | JP2 |
Capture Device | Fujitsu fi-5650C |
Capture Details | ScandAll 21 |
Transcript | 87 WASTEWATER MANAGEMENT IN SEMICONDUCTING ELECTRONIC CRYSTAL MANUFACTURING FACILITIES Joseph M. Wong, Project Manager Brown and Caldwell Consulting Engineers Pleasant Hill, California 94523 INTRODUCTION The last 15 to 20 years have seen a rapid evolution of electronic technology. The semiconducting electronic crystals industry is growing in the United States as well as in other parts of the world. A major part of that evolution has been the development of single crystals with unique structural and electronic properties. These crystals are essential parts of most microelectronic devices. The manufacturing processes require large quantities of chemicals and water for etching and cleaning. Consequently, wastewater from these plants may require extensive treatment before discharge. Figure 1 shows the basic manufacturing processes for semiconducting electronic crystals and some of the wastes produced.1 ENVIRONMENTAL REGULATIONS The U.S. Environmental Protection Agency (EPA) promulgated regulations to limit the discharge of pollutants into navigable waters and publicly owned treatment works (POTW) from semiconductor and electronic crystal manufacturing facilities on April 8, 1983.2 Under the title "Electrical and Electronic Components Point Source Category Effluent Limitations Guidelines, Pretreatment Standards, and New Source Performance Standards," these regulations provided effluent limitations for "best practicable technology" (BPT), "best available technology" (BAT), "best conventional technology" (BCT), "new source performance standards" (NSPS) for direct dischargers, and pretreatment standards for new and existing sources (PSNS and PSES) of indirect dischargers. Table I presents the effluent limitations for the Electronic Crystals Subcategory of these regulations. Materials listed as comprising total toxic organics (TTO) in these regulations include 30 priority organic compounds2 that were detected in significant quantities during the sampling and analytical EPA program conducted as a basis for the regulation. Since periodic effluent sampling and analysis for these numerous organics could be very expensive, this regulation allows, as an alternative to the usual monitoring requirements, plants to certify that spent solvents are not discharged into the wastewater, but are collected for contract disposal or for sale to reclaimers. In requesting that no monitoring of TTO be required, plants must submit a solvent management plan to the permitting authority. This plan then becomes a provision of the permit. WASTEWATER CHARACTERISTICS EPA has developed the limitations and standards in these regulations to cover a typical plant for this industry. However, in specific cases, such as more stringent state water quality standards, the permitting authority may have to establish permit limits on toxic or conventional pollutants that are not covered by this regulation. Furthermore, discharges to POTW are required to comply with local ordinances that may be more stringent than these pretreatment limitations. Based on the author's experience with integrated silicon wafer manufacturing plants, other significant water borne pollutants that may occur in these wastewaters include biochemical and chemical oxygen demand (BOD/ COD), nitrate, ammonia, and chromium. Chromium is regulated under the Metal Finishing Category Regulations. 863 |
Resolution | 300 ppi |
Color Depth | 8 bit |
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